Nonvolatile memory system, semiconductor memory, and writing method

ABSTRACT

A nonvolatile semiconductor memory recovers variation in the threshold of a memory cell due to disturbance related to a word line. The nonvolatile memory continuously performs many writing operations without carrying out single-sector erasing after each writing operation, performing the additional writing operations quicker than the usual writing operation, and lightening the burden imposed on software for use in additional writing. The data stored in a designated sector is read out before being saved in a register, and the selected sector is subjected to single-sector erasing when a predetermined command is given. Then write expected value data is formed from the saved data and data to be additionally written, completing the writing operation.

This is a continuation application of U.S. Ser. No. 11/896,969, fieldSep. 7, 2007, now U.S. Pat. No. 7,405,979, which is a continuationapplication of U.S. application Ser. No. 11/498,230, filed Aug. 3, 2006,now U.S. Pat. No. 7,283,399, which is a continuation of U.S. Ser. No.11/342,885, filed Jan. 31, 2006, now U.S. Pat. No. 7,145,805, which is acontinuation of U.S. Ser. No. 11/075,813, filed Mar. 10, 2005, now U.S.Pat. No. 7,072,222, which is a continuation of Ser. No. 10/681,280,filed Oct. 9, 2003, now U.S. Pat. No. 6,873,552, which is a continuationof U.S. Ser. No. 10/388,444, filed Mar. 17, 2003, now U.S. Pat. No.6,683,811; which is a continuation application of U.S. Ser. No.10/095,565, filed Mar. 13, 2002, now U.S. Pat. No. 6,567,311; which is acontinuation application of U.S. Ser. No. 09/961,300, filed Sep. 25,2001, now U.S. Pat. No. 6,385,092; which is a continuation applicationof U.S. Ser. No. 09/714,552, filed Nov. 17, 2000, now U.S. Pat. No.6,392,932; which is a continuation application of U.S. Ser. No.09/468,329, filed Dec. 21, 1999, now U.S. Pat. No. 6,157,573; which is acontinuation application of U.S. Ser. No. 09/342,231, filed Jun. 29,1999, now U.S. Pat. No. 6,023,425; which is a continuation applicationof U.S. Ser. No. 09/135,175, filed Aug. 18, 1998, now U.S. Pat. No.5,982,668; which is a continuation application of U.S. Ser. No.08/889,191, filed Jul. 8, 1997, now U.S. Pat. No. 5,867,428. Thisapplication is related to U.S. Ser. No. 09/323,684, filed Jun. 2, 1999,now U.S. Pat. No. 6,009,016 and U.S. Ser. No. 09/993,685, filed Nov. 27,2001, now U.S. Pat. No. 6,452,838.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to information writing for a nonvolatilesemiconductor memory, and more particularly to a nonvolatile memorysystem with improved single-sector erasing.

2. Description of the Related Art

A flash memory, which is a kind of EEPROM (Electrically ErasableProgrammable Read Only Memory), employs nonvolatile memory elements,such as MOSFETS, (metal-oxide semiconductor field-effect transistors),each having a control gate and a floating gate. The flash memory storesinformation in individual memory cells, each constituted by a MOSFETaccording to the transistor threshold voltage. In such a flash memory,the threshold voltage is set low (logic “0”) during the writingoperation by putting the drain voltage of the nonvolatile memory elementat, for example, 5 V, and by putting the word line connected to thecontrol gate CG at, for example, −10 V as shown in FIG. 18, so as todraw electrical charge from the floating gate FG into the drain region.During an erasing operation, the threshold is set high (logic “1”) byputting the well region at −5 V, for example, and the control gate CG ata voltage as high as 10 V (logic “1”) so as to inject negative chargeinto the floating gate FG as shown in FIG. 19. Thus, one-bit data isstored in one memory cell.

SUMMARY OF THE INVENTION

In a typical conventional flash memory, control gates of a plurality ofmemory cells are connected to one word line. With the plurality ofmemory cells connected to the word line as a basic unit (hereinaftercalled a ‘sector’), erasing, writing, and reading operations areperformed in respective operating modes. For example, the erasingoperation is simultaneously performed in a plurality of memory cellshaving a common word line, on a sector basis, and a specific memory cellis not selectively erasable.

On the other hand, the conventional writing operation is performed byraising the threshold as shown in FIG. 20( a) after the sector erasingoperation has been performed once, applying −10 V to the word lineconnected to the memory cell whose threshold is to be lowered, andapplying 5 V to the drain. As a result, the threshold of the writtenmemory cell becomes lower than the verify voltage Vpv as shown in FIG.20( b).

Although 0 V is applied to the drains of memory cells that are notwritten, that is, those whose thresholds are not intended to be lowered,a voltage as great as −10 V is applied to the gates of the other memorycells sharing the word line with the written cell. Consequently, thereoccurs a phenomenon, called a “disturbance”, in which the threshold isslightly lowered for all of the memory cells connected to the word line.Even memory cells that are not to be written are subjected to a slightthreshold voltage change (in this instance, voltage drop), though onlythe threshold of a specific memory cell to be written is desired to bevaried. This disturbance is called a “disturbance related to a wordline”, or “word disturbance”, since it occurs when voltage is appliedmainly to the word line.

Due to the word disturbance, the writing operation requires priorsingle-sector erasing, as shown with reference to FIGS. 20( a)-20(f).When the plurality of memory cells connected to a common word line aresubjected to single-sector erasing initially, the thresholds of theplurality of memory cells are all put in the erased state (FIG. 20( a)).Then, the writing operation is performed so as to put the threshold of aspecific memory cell selectively in the written state (FIG. 20( b)). Atthis time, the plurality of memory cells substantially consist of afirst memory cell group whose threshold voltage is in the erased state(shown by a dotted line of FIG. 20( c)) and a second memory cell groupwhose threshold voltage is in the written state (shown by a dotted lineof FIG. 20( d)).

Since the memory cells cannot be erased selectively, only the firstmemory cell group remains writable. Therefore, any one of the cells inthe first memory cell group can be selected and written. Then, when theword disturbance occurs, the threshold voltage of the not-written memorycells is lowered, as shown by a solid line in FIGS. 20( c)-20(d).

If no single-sector erasing is performed, the multiple repetition ofdisturbance resulting from repeated writing operations lowers thethreshold of the memory cell below a word line reading voltage level Vrat the time of reading data, as shown in FIG. 20( e), and causes errordata to be read out. Further, the threshold of the memory cell becomeslower than the ground potential Vss, whereby the memory cell is turnedON even though not selected, as shown in FIG. 20( f). When a memory cellconnected to a different word line but to a common source line isselected, the charge on the data line flows into the source through thememory cell whose threshold is lower than the aforementioned groundpotential Vss, with the result again that error data may be read out.

A system of increasing the threshold of a memory cell through thewriting operation is also known, by making the low threshold state anerased state depending on the memory array configuration. However, adisturbance phenomenon still exists in such a writing system because thethreshold of a non-written memory cell having a common word line at thetime of writing becomes slightly higher (see FIGS. 21( c), 21(d)). Whendisturbance is repeated several times, the threshold of the memory cellbecomes higher than the word line reading level Vr at the time ofreading data as shown in FIG. 21( e). Again, error data may be read out.

FIGS. 22( a)-22(f) show an information map of sectors controlled by oneword line. As shown in FIGS. 22( a)-22(c), a 512-byte (4096-bit) memorycell is connected to one word line. The effective utilization of thememory can be planned by providing within the same sector a mixture of astorage area (hereinafter called the “system area”), which is usuallynot written by general users, for storing OS (operating system)information, sector control information and the like, and a storage area(hereinafter called the “user area”) to which users are allowed to writeinformation freely. The number of bits in the system area is far smallerthan the number of bits in the user area.

In the flash memory of such a storage system, predetermined data iswritten to the system area, whereas the unwritten user area is offeredto the user. It would be convenient to be able to selectively write tothe memory cells in the large user area so as to permit repeated“additional” writing operations, without affecting the already-writtensystem area, and without first erasing the system area. In other words,it would be convenient for the user to be able to write to the unwrittenuser area without requiring an intermediate sector erase. However, suchadditional writing operations have not been possible because ofdisturbance, which prevents the reliability of information stored in theconventional flash memory from being assured.

Even though such additional writing has been conceivable, there has beena substantial limit on the number of additional writing operations to berepeated continuously in consideration of the threshold variation due tothe disturbance. By way of example, as few as two consecutive writingoperations have compromised the integrity of stored data in the priorart, due to disturbance.

Furthermore, the memory itself has not been designed for use in themanner mentioned above. For this reason, if additional writing iscarried out in the conventional flash memory, the time required for theadditional writing is extremely long, a burden too heavy for the systemsoftware because of the necessity to synthesize the read data and theadditional write data, and to write the data combination after readingout the data in the sector involved and then subjecting the sector tosingle-sector erasing as discussed above.

An object of the present invention is to provide a nonvolatilesemiconductor memory that is capable of recovering a variation in thethreshold of a memory cell due to disturbance related to a word line.

Another object of the present invention is to provide a nonvolatilesemiconductor memory that is capable of continuously performing anadditional writing operation without carrying out a single-sector erasefor each write.

Still another object of the present invention is to provide anonvolatile semiconductor memory that is capable of performing anadditional writing operation at a speed higher than that which isrequired for the usual writing operation, lightening the burden imposedon software for use in additional writing.

A brief description will be given of the substance of the inventiondisclosed in the present specification.

The data stored in a sector at a designated address is read out beforebeing saved in a register, and the sector involved is subjected tosingle-sector erasing when a predetermined instruction (command) isgiven. Actual write data (hereinafter called the “write expected valuedata”) is formed from the saved data and data to be additionallywritten, so that a writing operation is performed.

The flash memory system comprises a plurality of memory cells forstoring information in conformity with first and second thresholdvoltage states. The memory cells are arranged in a functional memoryarray having a word line connected to control gates of the plurality ofmemory cells, and a sequencer which has a command input terminal forcontrolling erase and write operations on information stored or to bestored in the plurality of memory cells in accordance with aninstruction which is input to the command input terminal. Theinstruction that the sequencer receives may be an erase command forcollectively putting the plurality of memory cells in the first (erased)state, or an “additional write command” for selectively changing atleast one of the memory cells from the first state to the second state,the additional write command being used for executing not the erasecommand, but a write operation performed continuously (i.e., a pluralityof times without an intervening sector erase).

In a more preferable embodiment of the invention, some of the pluralityof memory cells whose threshold voltage is in the first state constitutea first memory group, and the rest constitute a second memory group.According to the additional write command, then, the following steps aretaken: The threshold voltage of the memory cells in the second memorycell group is placed between the first state and the second state, andsubsequently at least one memory cell selected from those in the firstmemory cell group is put in the second state, along with those in thesecond memory cell group.

According to a further preferable embodiment of the invention, theinstruction that the sequencer receives includes an erase command forcausing a first voltage to be applied to the word line to collectivelyput the threshold voltage of the plurality of memory cells in the firststate. Then, a first write command causes a second voltage to be appliedto the word line to put the threshold voltage of memory cells in theselected first memory cell group in the second state, and a second writecommand causes the first voltage to be applied so as to change thethreshold voltage of the plurality of memory cells from the second stateto the first state. The second voltage is then applied to the word lineto put the threshold voltage of memory cells in the selected secondmemory cell group in the second state.

Thus, the variation in the threshold voltage of the memory cells due tothe word disturbance at the time of the additional writing is recovered,and error data is prevented from being read. Consequently, it ispossible to increase greatly the number of times that additional writingis continuously carried out without executing an erasing instruction. Byway of example, the present invention is capable of performing 15consecutive write operations without an intervening sector erase.

By using additional write data fed from the outside and the data readfrom the selected sector and held in the internal register, the writeexpected value data is arranged to be automatically formed inside, andthen the writing operation is performed. With this arrangement, theadditional writing operation can be performed at a speed higher than theordinary writing, and the burden imposed on software at the time ofadditional writing is lightened.

These and other objects, advantages, and novel features of the presentinvention will become apparent from the following detailed descriptionwhen read in connection with the accompanying drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a schematic overall block diagram illustrating a flash memoryembodying the present invention.

FIG. 2 is a circuit diagram showing an exemplary arrangement of a memoryarray of a flash memory according to the present invention.

FIG. 3 is a circuit diagram showing specific examples of a sense latchcircuit SLT and a data inverting circuit WRW.

FIG. 4 is a flowchart showing an additional writing procedure for aflash memory according to an embodiment of the invention.

FIG. 5 is a timing chart showing signal timing in the memory array atthe time of additional writing (first half) in a flash memory accordingto an embodiment of the invention.

FIGS. 6( a)-6(c) are waveform charts showing sense latching at the timeof additional writing (first half) and a data line level displacement ina flash memory according to an embodiment of the invention.

FIG. 7 is a timing chart showing signal timing in the memory array atthe time of additional writing (second half) in a flash memory accordingto an embodiment of an invention.

FIGS. 8( a)-8(b) are waveform charts showing sense latching at the timeof additional writing (second half) and a data line level displacementin a flash memory according to an embodiment of the invention.

FIGS. 9( a)-9(c) explain the variation in the threshold of a memory cellat the time of additional writing in a flash memory according to anembodiment of the invention.

FIGS. 10( a)-10(f) explain the variation in the threshold of a memorycell in a flash memory according to an embodiment of the invention.

FIG. 11 is a circuit diagram showing another memory array of a flashmemory according to the present invention.

FIGS. 12( a)-12(f) explain the variation in the threshold of a memorycell in the flash memory of FIG. 11.

FIG. 13 is a flowchart showing a first-stage read command executingprocedure for explaining a second flash memory embodying the presentinvention.

FIG. 14 is a flowchart showing a second-stage erase command executingprocedure for explaining a second flash memory embodying the presentinvention.

FIG. 15 is a flowchart showing a third-stage write command executingprocedure for explaining a second flash memory embodying the presentinvention.

FIG. 16 is a schematic overall block diagram illustrating a third flashmemory embodying the present invention.

FIG. 17 is a schematic block diagram of a memory card as an example ofan application of the flash memory according to the present invention.

FIG. 18 is a sectional view showing an example of applied voltage at thetime of writing a memory cell in a flash memory.

FIG. 19 is a sectional view showing an example of applied voltage at thetime of erasing a memory cell in a flash memory.

FIGS. 20( a)-20(f) show the variation in the threshold of the memorycell in a conventional flash memory.

FIGS. 21( a)-21(e) show the variation in the threshold of the memorycell in another conventional flash memory.

FIGS. 22( a)-22(f) collectively show an exemplary arrangement of anadditionally writable sector in a flash memory.

FIGS. 23( a)-23(f) explain the variation in the threshold of a memorycell in a flash memory according to an embodiment of the invention.

FIGS. 24( a)-24(f) explain the variation in the threshold of a memorycell in the flash memory of FIG. 11.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

A description will subsequently be given of the present inventionapplied to a flash memory and embodiments thereof by reference to theaccompanying drawings.

Embodiment 1

FIG. 1 shows a flash memory embodying the present invention. Each of thecircuit blocks in FIG. 1 is shown formed on one semiconductor chip 1 ofsingle-crystal silicon, although the invention is not so limited.

In FIG. 1, a memory array 11 is constituted by a plurality of individualtransistor cells arranged in a matrix, each of which has a floating gateas shown in FIG. 18. A data register 12 holds data of one sector readfrom the memory array 11 and write data fed from the outside, and arewrite circuit 13 is provided between the memory array 11 and the dataregister 12.

An address register 14 holds an address signal fed from the outside, anX-decoder 15 selects one word line out of the word lines within thememory array 11 and which corresponds to the address received by theaddress register 14, and a Y-address counter 16 sequentially transfersthe write data received from the outside to the data register 12 andgenerates a Y-address signal (data-line selecting signal) for outputtingthe data that has been read into the data register 12 outside. TheY-address counter 16 has the function of sequentially updating theleading address of one sector up to its final address and outputting theupdated result, in conjunction with a Y-decoder 17 that decodes theY-address generated so as to select one data within the one sector, anda main amplifier 18 for amplifying the data read into the data register12 and outputting the amplified data.

The flash memory according to the present embodiment of the inventionhas a data input/output interface that can be serially accessible,although the flash memory is not so limited. At the time of reading, forexample, one word line is selected when the address of a sector to beread is input, and data are read in parallel from the plurality ofmemory cells connected to the word line and then held in a sense latchSLT group once, which will be described later. The sense latch group iscontained in the data register 12 and successively selected by theY-address counter, the data held therein being serially output. At thetime of writing, serial data are input and written to the selectedsector via a reverse path. Further, a plurality of input/outputterminals are provided for the memory chip, via which data equivalent toone sector are divided and serially input/output.

Although not limited thereto, the flash memory according to thisembodiment of the invention further comprises a command register &decoder 21 for holding commands supplied from an external CPU and thelike and decoding the commands, and a control circuit (sequencer) 22 forsequentially forming control signals intended for respective circuits inthe memory so as to perform a process corresponding to the command onthe basis of the result decoded by the command register & decoder 21.When a command is given, the flash memory is adapted to decode thecommand and automatically start performing a corresponding process.

Like the control unit of a CPU of a microprogram system, for example,the control circuit 22 has a ROM (Read Only Memory) in which is stored aseries of microinstructions for executing commands. When the commandregister & decoder 21 generates the leading address of themicroinstructions corresponding to the command and provides the controlcircuit 22 with the leading address, a microprogram can be arranged sothat it is started then. Software installed in the ROM is stored with aninstruction procedure which will be described with reference to FIG. 4,and conditions including the duration of voltage application and thelike. The ROM may be loaded with only a minimum of microinstructions,whereas a rewritable flash memory may be stored with instructionconditions and additional programs.

Further, the flash memory according to this embodiment of the inventionis provided with, in addition to the aforementioned circuits, an I/Obuffer 23 for inputting/outputting an address and a data signal, acontrol signal buffer 24 for receiving the control signal supplied fromthe external CPU and the like, and an internal power supply circuit 25for generating voltages necessary within the chip, including writevoltage Vw (−10 V) applied to the word line on the basis of sourcevoltage Vcc, erasing voltage Ve (10 V), read voltage Vr (2 V), verifyvoltage Vpv (1 V), and the like. A power source selecting circuit 26 forselecting a desired one of these voltages in accordance with theoperating state of the memory is also provided, and supplies theselected voltage to the memory array 11, X-decoder 15 and the like.Incidentally, Vw and Ve, which are greater than the source voltage, aregenerated by an on-chip charge pump circuit included in the internalpower supply circuit 25.

In the flash memory according to this embodiment of the invention, anaddress signal, a write data signal and a command input share anexternal I/O terminal (pin) in common, although no limitation isintended. Therefore, the I/O buffer 23 operates so as to distinguishbetween these input signals according to a control signal from thecontrol signal buffer 24, receives one of the input signals, and thensupplies it to a predetermined internal circuit.

The control signals fed from the external CPU and the like into theflash memory according to this embodiment of the invention include, forexample, a reset signal RES, a chip enable signal CE, a write enablesignal WE, an output enable signal OE, a command data enable signal CDE(for indicating whether the signal is a command, data input, or addressinput), a system clock signal SC, and the like.

An external general-purpose microcomputer LSI may be used to controlthis apparatus because it is only necessary for the apparatus to beequipped with an address generating function and a command generatingfunction.

FIG. 2 shows a specific example of a system for lowering the thresholdof a memory cell by writing, according to the teachings of the presentinvention. The memory array 11 according to this embodiment of theinvention comprises two mats; FIG. 2 shows a specific example of one ofthe memory mats. As shown in FIG. 2, each memory mat has a memory trainMCC, including n parallel memory cells (MOSFETs having floating gates)MC1-MCn, which are arranged in the vertical direction and whose sourcesand drains are commonly connected together. A plurality of memory trainsMCC are arranged in the horizontal direction (in the direction of wordlines WL) and in the vertical direction (in the direction of data linesDL).

In each of the memory trains MCC, the drains and sources of the n memorycells MC1-MCn are connected to a common local data line LDL and a commonlocal source line LSL. The local data line LDL can be connected via aselection MOSFET Qsl to a main data line DL, and the local source lineLSL can also be connected via a selection MOSFET Qs2 to the groundingpoint or negative voltage. Those memory trains MCC that are arranged inthe direction of word lines are formed in the same well area WELL on asemiconductor substrate.

Though not so limited, the system having the described memory arrayarrangement, and which assumes the erased state at high thresholdvoltage and the written state at low threshold voltage, may be called anAND type flash memory as shown in FIG. 2. At this time, injectingelectrons into the floating gate (which raise the threshold voltage toattain the erased state) employs, though not so limited, FN(Fowler-Nordheim) tunnel injection from a transistor channel, and FNtunnel emission to a diffusion layer is employed for drawing electronsfrom the floating gate (to lower the threshold voltage to attain thewritten state).

Those memory trains MCC that are arranged in the direction of the wordlines are formed in the same well area WELL on the semiconductorsubstrate. A negative voltage of −3 V is applied to the well area WELLand the respective local source lines LSL when data is erased, and avoltage of 10 V is applied to the word lines having the common wellarea, making possible single-sector erasing. The selection MOSFET Qs2 isturned on at the time of erasing data, so that a negative voltage of −3V is applied to the source of each memory cell. At this time, theselection MOSFETs Qs1 are turned off and the drain is set at −3 V whenthe source-side voltage is applied through the channel of each memorycell which is turned on as the control gate is supplied with a highvoltage of 10 V.

On the other hand, a negative voltage of −10 V is applied to the wordline connected to the selection memory cell at the time of writing data,and the main data line DL corresponding to the selection memory cell isset at a potential of 3 V. Further, the selection MOSFET Qs1 on thelocal data line LDL connected to the selection memory cell is turned onand 3 V is applied to the drain. However, the selection MOSFET Qs2 onthe local source line LSL is turned off.

Further, a read voltage Vr (e.g., 2.0 V) is applied to the word lineconnected to the selection memory cell at the time of reading data andthe main data line DL corresponding to the selection memory cell isprecharged at 1 V. Moreover, the selection MOSFET Qs1 on the local dataline LDL connected to the selection memory cell is turned on. Then, theselection MOSFET Qs2 on the local data line LDL connected to theselection memory cell is turned on and supplied with the groundingpotential (0 V). Thus, a transistor through which current flows inresponse to the threshold voltage of the memory cell (the LDL potentialis reduced to 0 V) is distinguished from another through which nocurrent flows (the LDL potential is kept at 1 V), whereby theinformation stored in the memory cell is read out.

The voltage at the time of writing and erasing data is lower than thevoltage in the conventional types of FIGS. 18-19 because of the reducedelement dimensions attained by the use of not only a microprocessingtechnique, but also the 3 V source voltage Vcc instead of theconventionally employed 5 V.

To one end of the main data line DL (on the central side of the memoryarray), a sense latch circuit SLT is connected for detecting the dataline level at the time of reading, and for applying a potentialcorresponding to write data at the time of writing. A data invertingcircuit WRW forms expected value data at the time of additional writing.The sense latch circuits (sense amplifier with latching function) SLTconstitutes the data register 12 in FIG. 1, and the data invertingcircuits WRW constitute the rewrite circuit 13. The two memory arraysformed in the two WELLs are called memory mat a (MATa). In this case thenumber of main data lines and SLTs are made to correspond to one sector;for example, 4224 (512+16 bytes) of them are provided in parallel.

Since two memory mats constitute the memory array according to thisembodiment of the invention, the data inverting circuit WRW and a memorymat b (MATb) (not shown) are arranged on the opposite side of the senselatch circuit SLT, that is, in the lower side of FIG. 2, and each maindata line DL within the memory array is connected via the correspondingdata inverting circuit WRW to the other input/output terminal of thesense latch circuit SLT. In other words, WRW is provided in each of MATaand MATb (called WRWa, WRWb when distinguished from each other), and SLTis commonly used by the two memory mats.

FIG. 3 is a circuit diagram showing specific examples of the sense latchcircuit SLT and the data inverting circuit WRW. Although there are shownone data line within the memory mat on one side and only one memorytrain MCC connected to the data line for convenience of explanation(because the circuit is symmetrical about the sense latch circuit),actually a plurality of memory trains MCC are connected thereto. Asshown in FIG. 3, the sense latch circuit SLT is formed with a flip-flopcircuit resulting from cross-linking the input/output terminals of twoCMOS inverters each having P-channel and N-channel MOSFETs. Further,column switches MOSFET Qya, Qyb forming “Y gates”, which are on/offcontrolled by the output of the Y-decoder, are connected to a pair ofinput/output terminals Na, Nb of the aforementioned sense latch circuitSLT, respectively. The other ends of the plurality of column switchesprovided on a main data line basis are commonly connected tocomplementary common input/output lines (IO, /IO).

The data inverting circuit WRWa includes a transmission MOSFET Qt1connected between one input/output terminal Na of the sense latchcircuit SLT and a main data line DLa within the memory mat on one side,a precharge MOSFET Qp1 which is connected between the source voltageterminal Vcc and the main data line DLa and controlled by a controlsignal PC2A, and MOSFETs Qt2, Qp2 connected between a prechargeswitching terminal VPC and the main data line DLa in series. Thepotential of the input/output terminal Na of the sense latch circuit SLTis applied to the gate of Qt2, whereas a control signal PC1A is appliedto the gate of Qp2. Moreover, the source voltage Vcc or Vss is suppliedto the precharge switching terminal VPC.

To the other input/output terminal Nb of the sense latch circuit SLT, adata inverting circuit WRWb including the MOSFETs Qt1, Qt2, Qp1, Qp2arranged likewise is connected.

FIG. 4 shows a control procedure at the time of writing additional databy means of the control circuit 22. An additional write command forstarting the additional writing is designated by an 8-bit code set as acommand fed from the input/output terminal when the command enablesignal CDE of FIG. 1 is made effective. As will be described later,though the control circuit accepts an erase and a write commandadditionally, these commands are distinguished by a difference in code.The command numerical value is decoded by a command decoder and a seriesof programs corresponding thereto are started.

The control sequence is started when the additional write command istaken in by the command register & decoder 21. When the control sequenceis started, an additional write mode is set up in the chip and “1” isset in the whole sense latch circuit SLT of the data register 12 (StepS1). Subsequently, the write address fed from the outside is stored inthe address register 14 (Step S2). Then at least one additional writedata fed from the outside is stored in the data register 12 (Step S3).

When the write starting command is received in the command register &decoder 21 from the outside, further, a sector address (X-address) heldin the address register 14 is decoded by the X-decoder 15, and one wordline in the memory array 11 is selected and set at a read level of 2 V.Thus, data equivalent to one sector are read out into the data register12, and write expected value data are created on the basis of theadditional write data and held in the data register 12 (Step S4). Theprocessing stated above is automatically performed by the rewritecircuit 13 (data inverting circuit WRW) under the control of the controlcircuit (sequencer) 22.

Subsequently, 10 V and an erase pulse of −3 V are applied to theselection word line and the well region, respectively, so that thethreshold of all memory cells of the sector involved is raised to attainthe erased state (Step S5). Thus, the stored data having “0” in thememory cell is changed to “1” as the threshold is raised to Vev orgreater as shown in FIG. 10( e), and disturbance is recovered in thememory cells with the stored data having “1” as shown in FIG. 10( c). Inthis case, the disturbance related to the memory cells where the storeddata are “1” has been caused when another memory cell in the same sectorhas been written.

Although there has been shown an example of raising the threshold of allmemory cells of the sector to Vev or greater at Step S5 of FIG. 4, thepresent invention is not limited to this example, but is, as shown inFIG. 23( e), applicable to a case where the threshold of the memorycells with data already written thereto in the sector is raised to theextent that it exceeds voltage Pcv.

The operation of not collectively raising the threshold of all memorycells of the sector to the voltage Vev but raising it close to the highpotential side is called pseudo-erasing for convenience of explanation.When compared with the operation of collectively erasing all memorycells of the sector, the pseudo-erasing is distinguished by the voltageapplication time from the former, though the voltage applied to thememory array is similar. In other words, 10 V is applied to theselection word line normally for 1 ms in order to completely erase thememory cells in the written state by executing an erase command asdescribed in FIG. 14 later, whereas in the case of the pseudo-erasing,approximately 0.1 ms, which is about 1/10, is considered to besatisfactory.

Therefore, the threshold voltage of the first memory cell group in thesecond state within one sector is not completely changed up to thethreshold voltage in the first state but remains in between the firstand second state. Moreover, the threshold voltage of the second memorycell group in the first state, as the remainder of the first memory cellgroup in the same sector, is changed in the voltage direction in whichthe threshold voltage is gradually raised (i.e., the voltage directionin which the second state of the threshold voltage is changed to thefirst state). More specifically, the pseudo-erasing operation is notintended to erase the memory cell completely, but to change thethreshold voltage in the opposite voltage direction to the extent thatthe change is offset in expectation of variation in the thresholdvoltage in the voltage direction from the first state to the secondstate caused by word disturbance.

Then the selection word line is set at −10 V and the data line uses theexpected value data created at Step S4 and held in the data register(sense latch SLT) 12 to selectively set the voltage level of LDL at 3 V,and writes data to the above erased sector (Step S6). The voltage levelof LDL that is not written is set at 0V. Then, verify voltage Vepv isused for reading and determining whether or not the threshold has beenlowered sufficiently, by deciding whether the data held in the dataregister 12 have been totally set to “0” (Step S7). If any “1 s” areleft, the presence of a high-threshold memory is decided and Step S6 isfollowed again, whereupon the data then held in the data register 12 areused to repeat the verifying operation again.

During the process of repeating the verifying operation, the memorycells whose threshold has been lowered sufficiently (the thresholdvoltage is lower than the verify voltage Vpv) are arranged so that theyare prevented from being written with the voltage level of LDL set at 0V. Then the remaining memory cells whose threshold has not been reducedsufficiently are selectively written and, when the threshold voltage ofthe memory cell group to be written is totally sufficiently lowered,rewriting and verifying are suspended.

The write verify corresponds to a variation in writing time of thememory cells in the same sector. In other words, the memory cells set atthe threshold in the first and second states because of thepseudo-erasing have write times far shorter than that of the memory cellwhose threshold is changed from the first state to the second state.With the use of write verify, variation in the threshold voltage at thetime of writing is suppressed and the threshold voltage is effectivelyprevented from becoming Vss or lower.

FIGS. 5-8 show signal timings in each component of the memory array andthe data inverting circuit WRW in detail at the time of generating thewrite expected value data at Step S4 in the additional writing flowdescribed above. FIGS. 5-8 show signal timings for the right-hand sidememory mat MATa in the memory array shown in FIG. 3. Further, Table 1shows variation in the data held in the data register 12 and the dataline level during the process of generating the aforementioned writeexpected value data in the order of time from up to down.

TABLE 1 UNUSED USED MEMORY DATA 1 1 1 1 1 1 1 1 1 0 1 0 1 0 ADDITIONALDATA 1 0 0 1 0 0 1 0 — — — — — — DATA LINE t1 H L L H L L H L H H H H HH & REGISTER t2 H L L H L L H L H L H L H L t5 1 0 0 1 0 0 1 0 1 0 1 0 10 t6 H H H H H H H H H H H H H H t7 L H H L H H L H L H L H L H t10* 0 11 0 1 1 0 1 0 1 0 1 0 1 *Expected data

As shown in Table 1, the additional write data are stored in thepredetermined bits of the data register (sense latch SLT) 12. Asdescribed above, data “1” (i.e., the threshold is not varied at thisstage) is set in the sense latch SLT corresponding to the memory cellnot to be additionally written (the memory cell to which data hasalready been written) in the same sector. In other words, though theitem of additional data in a column being used is shown by “-” in orderto make it clear that no addition writing is made in Table 1, the timeis actually “1”. Moreover, Vcc (high level) is initially supplied to thevoltage source selector terminal VPC in the data inverting circuit WRW.

As shown in FIG. 5, signals PC2B, PC1A are first caused to rise (t1) inthat state, whereby the MOSFET Qp1 in the data inverting circuit WRW inMATb on the non-selection side is turned on, so that a plurality of maindata lines DLb are precharged at a reference potential (e.g., 0.5 V). Onthe other hand, the MOSFET Qp2 in the data inverting circuit WRW in MATaon the selection side is turned on and the MOSFET Qt2 is turned on whenthe data held in the sense latch SLT is “1” and turned off when it is“0”. Therefore, the main data line DLa corresponding to “1” of the dataheld in the sense latch SLT is precharged at 1 V and the main data lineDLa corresponding to “0” of the data thus held is set at Vss (lowlevel). Since the data “1” has been set in the sense latch SLTcorresponding to the memory cell not to be additionally written (thememory cell to which data has already been written), the correspondingmain data lines DLa are totally precharged at 1 V.

Subsequently, one word line, a local drain selection signal SD, and alocal source selection signal SS are caused to rise, and the selectionMOSFET Qs1 in the memory array is turned on (timing t2 of FIG. 5),whereby since the memory cells (low threshold) with data “0” alreadywritten is turned on, the corresponding main data line DLa is dischargedand set at the low level. On the other hand, the corresponding main dataline DLa remains at the high level since the memory cells (highthreshold) with stored data of “1” are turned off. Further, since theunwritten (in the erased state) memory cells (high threshold) are turnedoff, the main data line DLa corresponding to additional write data of“1” held in the sense latch SLT is set at 1 V, and the main data lineDLa corresponding to additional write data of “0” is set at Vss.

Subsequently, the source voltages SLP, SLN of the sense latch SLT arereset (SLP=SLN=0.5 V) and the data thus held is canceled once (timing t3of FIG. 5). Then a signal TR is set at the high level and thetransmission MOSFET Qt1 on the data line is turned on so as to transferthe potential of the data line to the sense latch SLT (timing t4 of FIG.5). Further, the source voltages of the sense latch SLT are put in aforward bias state to amplify the potential of the data line (timing t5of FIG. 5). FIGS. 6( a)-6(b) show variation in the input/output node ofthe sense latch SLT and potential of the main data lines DLa, DLb whenthe aforementioned signal timing is followed.

In FIGS. 6( a)-6(c), symbol DAi represents the potential of theinput/output node Na on the mat MATa (the right-hand mat in FIG. 3) sideof the sense latch SLT; DBi, the potential of the input/output node Nbon the mat MATa (the left-hand mat, not shown in FIG. 3) side of thesense latch SLT; GDLAi, the potential of the main data line DLa on themat MATa; and GDLBi, the potential of the main data line DLb on the matMatb. Further, FIG. 6( a) shows waveforms in a case where the presentstate of the selection memory cell is the written state (low threshold);FIG. 6( b) shows waveforms in a case where the present state of theselection memory cell is the erased state (high threshold) and no datais written by additional writing; and FIG. 6( c) shows waveforms in acase where the present state of the selection memory cell is the erasedstate (high threshold) and data is written by additional writing.

As shown in FIG. 7, the signal TR is set at the low level and thetransmission MOSFET Qt1 is turned off to cause signals PC2A, PC2B torise (timing t6) in such a state that the data line is cut off from thesense latch SLT. At this time, the MOSFET Qp1 in the data invertingcircuit WRW is turned on and the main data lines DLa, DLb are prechargedat 1 V and 0.5 V, respectively. Then the voltage source selectorterminal VPC in the data inverting circuit WRW is switched over to Vssand the signal PC1A is caused to rise (timing t7 of FIG. 7).

Further, the MOSFET Qp2 in the data inverting circuit WRWa is turned onat the selection side, and the MOSFET Qt2 is turned on in response tothe data “1” held in the sense latch SLT and turned off in response tothe data “0”. Therefore, the main data line DLa corresponding to thedata “1” held in the sense latch SLT is discharged to Vss (low level)and the main data line DLa corresponding to the data “0” held therein isleft at 1 V (high level). In other words, a state in which the date heldin the data register 12 is inverted appears on the data line on theselection side.

Subsequently, the source voltages SLP, SLN of the sense latch SLT arereset and the data thus held is canceled once (timing t8 of FIG. 7).Then a signal TR is set at the high level and the transmission MOSFETQt1 on the data line is turned on so as to transfer the potential of thedata line to the sense latch SLT (timing t9 of FIG. 7). Further, thesource voltages of the sense latch SLT are put in a forward bias stateto amplify the potential of the data line (timing t10 of FIG. 7). Thus,write expected value data, reduced to “1” only by the sense latch SLTcorresponding to a memory cell to be written, is held in the dataregister 12. The write expected value data will readily be understoodfrom Table 1 as being prepared by arranging additional write data andthe data stored in the memory cell already written, and inverting thecombination.

In the flash memory according to this embodiment of the invention, whilethe write expected value data is held in the data register 12, all thememory cells in the sector involved are put in the erased state (highthreshold) or subjected to pseudo-erasing by applying the erase pulse tothe selection word line and the well area in such a state that thetransmission MOSFET Qt1 on the data line has been turned off. Then thewrite expected value data held in the data register 12 are used to carryout desired additional writing by precharging only the data line withthe held data “1” at a level of 3 V so as to apply −10 V to theselection word line. Consequently, the threshold of the memory cell thathas not been connected to the precharged data remains unchanged and thestored data becomes “1”, whereas the threshold of the memory cellsconnected to the precharged data are lowered, whereby the stored databecomes “0”.

In this case, the erase time can be curtailed because the threshold ofthe memory cell in the erased state at the time the erase pulse isapplied need only exceed the minimum write verify voltage.

FIGS. 8( a) and 8(b) show variation in the input/output node of thesense latch SLT and the potential of the main data lines DLa, DLb whenthe aforementioned signal timing is followed. FIG. 8( a) shows waveformsafter a case where the potential of the matA-side input/output node ofthe sense latch SLT remains at the high level on the termination of theoperation of FIG. 5 (timing t5), and FIG. 8( b) shows waveforms after acase where the potential of the matA-side input/output node of the senselatch SLT remains at the low level on the termination of the operationof FIG. 5 (timing t5).

FIGS. 9( a)-9(c) show the state of variation in the threshold before andafter additional writing to each memory cell. FIG. 9( a) shows variationof the memory cell in the prior-to-write state in which additional writedata is “1” at ‘erasing (stored data “1”)’ is “1”; FIG. 9( b) variationof the memory cell in the prior-to-write state in which additional writedata at ‘erasing (stored data “1”) is “0”’; and FIG. 9( c) variation ofthe threshold of the memory cell in the prior-to-write state in whichadditional write data is absent at ‘writing (stored data “1” is “0”)’.In FIGS. 9( a)-9(c), the gentle slope tilting toward the right means areduction in threshold due to disturbance. Those shown by a broken linein FIGS. 9( a)-9(c) refer to variation in the threshold in a case wherethe initial writing has also been carried out by the use of theadditional write command. In other words, writing using the additionalwrite command is effective since disturbance occurs even in the case ofwriting immediately after the single sector erasing of the memory cell.

Table 2 shows the relation among the state of the memory cell (storeddata), additional write data, and the write expected value data. SymbolsA, B, C in Table 2 represent corresponding variations in the thresholdof the memory cell in FIGS. 9( a)-9(c).

TABLE 2 WRITE STATE OF THE ADDITIONAL EXPECTED MEMORY CELL WRITE DATAVALUE DATA UNUSED (A) ERASE (“1”) 1 0 (NO WRITE) (B) ERASE (“1”) 0 1(WRITE) USED (C) WRITE (“0”) — 1 (WRITE) (A) ERASE (“1”) — 0 (NO WRITE)

FIGS. 10( a)-10(f) show variation in the threshold of each memory cellby applying additional write control according to this embodiment of theinvention. FIGS. 10( a)-10(f) collectively show a diagram illustrating atransition state of the threshold of a memory cell group in one sectorwith the X-axis representing voltage and the Y-axis representing thedegree of a memory cell at a specific threshold voltage.

In FIGS. 10( a)-10(f), a first state of the threshold voltage (erasedstate, logical state “1”) and a second state thereof (written state,logical state “0”) are defined. More specifically, the threshold voltageof the memory cell for determining the storage state of the memory cellis Vev or higher in the first state, and ranges from Vss to Vpv in thesecond state, in either case of which it is not a voltage at having aspecific value, but falls within a predetermined range (Vss to Vpv).According to this embodiment of the invention, as shown in FIGS. 10(a)-10(c), the threshold of the memory cell whose threshold has lowered,as shown by a broken line due to disturbance at the time of initialwriting, can be recovered.

Although a detailed description has not been given before, if a specificmemory cell group is written after one sector is subjected tosingle-sector erasing, the remaining memory cells undergo worddisturbance from the beginning. FIGS. 10( a) and 10(b) show variation inthe threshold in a case where the first memory cell group (in the erasedstate) is not written in an unused area where the threshold voltage isin the first state within the same sector, and FIGS. 10( c) and 10(d)show variation in the threshold in a case where the first memory cellgroup is written in that unused area. Moreover, FIGS. 10( e) and 10(f)show variation in the threshold of the second memory cell group in whichthe threshold voltage in a usable area is in the second written state.As is obvious from these figures, even the written memory cell is put inthe erased state once before being put in the written state according tothis embodiment of the invention.

Although a description has been given of a case where the sector isdivided into a usable and an unused area in the above embodiment of theinvention, the present invention is not limited to that case but may beimplemented so that the above unused area is divided into a plurality ofsections to make additional writing possible on a section basis.

Further, although a description has been given of a flash memory systemin which the threshold is lowered with a write pulse after performingthe erasing operation once to raise the threshold at the time of writingdata according to the above embodiment of the invention, such a systemmay raise the threshold with the write pulse after lowering thethreshold of the memory cell through the erasing operation.

The flash memory formed on one chip as shown in FIG. 1 according to thefirst embodiment of the invention includes at least a read command(shown in FIG. 13), the erase command (FIG. 14) for collectively puttingthe threshold voltage of memory cells in one sector in the first state,and the write command (FIG. 15—first write command) in addition to theadditional write command (second write command). A detailed descriptionwill be given of procedures of FIGS. 13-14 later. It takes about 1 ms tochange the memory cell group in one sector from the second state inthreshold to the first state by executing the erase command. It alsotakes about 1 ms to change the memory cell group from the first state inthreshold to the second state by executing the write command.

The function and the effect of the present invention are achievedaccording to the above embodiment as follows: When the additional writecommand of FIG. 4 is compared with the write command first, theadditional write command features a procedure at Steps S4-S5.Synthesizing final write data at Step S4 automatically contributes tosaving write time.

A comparison made in terms of the voltage applied to the word line,which characteristically determines the voltage direction of thethreshold voltage, includes a step of applying only +10 V for about 1 mswith the erase command of FIG. 14, and a step of applying only −10 V forabout 1 ms with the write command of FIG. 15. Moreover, it is featuredthat a step of applying −10 V which is followed by applying +10 V istaken in reference to FIG. 4. Further, the time required to apply +10 Vin the case of pseudo-erasing at Step S5 is far shorter than the timerequired to apply +10 V with the erase command.

In the method of saving write data of one sector in SLT once, subjectingthe memory cell to complete single sector erasing (about 1 ms) with theerase command, and then writing (about 1 ms) the final write datasynthesized from the data saved in SLT and new write data with the writecommand in order to avoid disturbance, requires a total of about 2 ms ormore. On the other hand, the use of the additional write command usingthe pseudo-erasing results in completing the writing operation in about1.1 ms, or about half the time, as writing is effected (about 1 ms)after the pseudo-erasing (about 0.1 ms). Since the disturbance iscompensated for by the pseudo-erasing, the additional write commandmakes it unnecessary to completely erase the sector by executing theerase command prior to executing the additional write command, as isrequired by the conventional system.

Further, since the word disturbance is greatly eased, the additionalwrite command may be executed many times without executing the erasecommand. Even when the additional write command is continuously executedabout 15 times or more without executing the erase command, the datastored in the same sector remains assured. The continuous repetition oferasing-writing 15 times requires about 30 ms according to the priorart, whereas the continuous execution of the additional write command 15times, plus only one erase command, total 17.5 ms, so that the writetime according to the invention is much shorter.

Embodiment 2

FIG. 11 shows a memory array of the aforementioned system for increasingthe threshold using the write pulse.

The difference between the memory array according to this embodiment ofthe invention and the memory array (see FIG. 2) according to thepreceding embodiment lies in the direct connection of the drains ofmemory cells MC1-MCn to respective main data lines DL, omittingselection MOSFETs Qs1, Qs2, and the connection of the sources of thememory cells MC1-MCn to a common source line CSL. However, both thememory arrays are similar in that a line of memory cells are connectedin parallel.

Moreover, in the memory array according to this embodiment of theinvention, the definition of the threshold voltage of the memory cell atthe time of writing and erasing data is opposite to what is given in theembodiment thereof in FIG. 2. The memory array shown in FIG. 11 may becalled a NOR-type flash memory, although the array is not so limited. Atthis time, the injection of electrons into the floating gate (to raisethe threshold voltage to attain the written state) uses, though not solimited, CHE (Channel Hot Electron) injection from the drain of thetransistor, and FN tunnel emission for drawing electrons from thefloating gate (to lower the threshold voltage to attain the erasedstate).

According to this embodiment of the invention, as shown in Table 3, avoltage as high as 10 V is applied to the control gate CG, whereas thegrounding potential (0 V) is applied to the source. On the other hand,different voltages depending on selection/non-selection are applied tothe drain. In other words, a voltage of 5 V is applied to the drain ofthe selection memory cell to turn it on to put the memory cell in the ONstate, thus causing current to flow across the source and drain, and thehot electrons generated then are injected into the floating gate,thereby raising the threshold of the memory cell for writing. Further, 0V is applied to the drain, like the source, of the non-selection memorycell, and the threshold of the memory cell consequently remains lowbecause no current flows across the source and drain of the memory cell.

TABLE 3 CG DRAIN SOURCE WRITE 10 5/0 0 ERASE −10 FLOATING 5 READ 5 1 0

At the time of erasing data, a negative voltage of −10 V is applied tothe control gate CG, and the drain is reduced to a floating state inwhich no voltage is applied. Further, a positive voltage of 5 V isapplied to the source, whereby electrons are drawn from the floatinggate of the memory cell so as to lower the threshold of the memory cell.This erasing operation is performed by the sectors sharing the word linein common. As 5 V is applied to the control gate, 0 V to the source, and1 V to the drain of the memory cell at the time of reading dataaccording to this embodiment of the invention, no drain current flowsthrough the memory cell having a high threshold, whereas the draincurrent flows through the memory cell having a low threshold.Consequently, data is read out by detecting the lowering of theprecharge level of the data line.

If additional write control similar to that in the preceding embodimentof the invention is applied, it is also possible in this embodiment ofthe invention to recover the threshold of the memory cell whosethreshold has risen because of disturbance at the time of initialwriting as shown by broken lines in FIGS. 12( a) and 12(c). FIGS. 12( a)and 12(b) show variation in the threshold in a case where the memorycell (in the erased state) in the unused area is not written; FIGS. 12(c) and 12(d) show variation in the threshold in a case where the memorycell in the unused area is written; and FIGS. 12( e) and 12(f) variationin the threshold of the memory cell in the written state in the usablearea. Thus, even the written memory cell is put in the erased state onceand then in the written state again according to this embodiment of theinvention. Further, FIGS. 24( a)-24(f) show that variation in thethreshold of the memory cell may be set so that it is slightly lowerthan voltage Vpv.

In summary, in Embodiment 2, an effect similar to that of Embodiment 1is achievable by reversing the high and low levels of threshold voltagein the first state and the second state.

Embodiment 3

FIGS. 13-15 show another embodiment of the invention. According to thisembodiment of the invention, a data read command, an erase command, anda write command from an external control unit are generally used forcarrying out additional writing without supplying the flash memory withthe additional write command and the expected value data function as inthe preceding embodiment of the invention. The flash memory to whichthis embodiment of the invention is applicable has a sequencer that iscapable of at least decoding a data read command, an erase command, anda write command as well as a start command, and executing thesecommands. Of these commands, the start command is not necessarilyrequired, and the flash memory may be arranged so that it isautomatically started.

A nonvolatile memory has a memory array and a sequencer which are formedon one chip and the sequencer is at least capable of executing basicinstructions including a read command (FIG. 13), an erase command (FIG.14), and a write command (FIG. 15). As described with reference toEmbodiment 1, the voltage application time of the word line with theerase command and executing steps are changeable so that completesingle-sector erasing and the above described pseudo-erasing can becarried out. A second erase command that is different in erase time maybe provided for special use in pseudo-erasing. At this time, eraseverify of the erase command is unnecessary.

The additional write command according to the present invention is inthe form of a macro command for executing the three basic instructionsabove successively and continuously. The command may be distributable toa magnetic medium or the like as a program executable by the CPU of, forexample, a personal computer. Therefore, the “sequencer” in thisembodiment is a combination of a sequencer in the narrow sense of amemory chip and an external CPU.

Moreover, the additional command may be in the form of an additionalprogram as a nonvolatile memory driver or often combined into the OS ofa computer. Therefore, this embodiment can be part of a computer systemhaving a nonvolatile memory chip capable of executing the three basicinstructions, and a CPU to which the memory chip is connected.

The following description refers to FIGS. 13-15.

When additional writing is carried out according to this embodiment ofthe invention, a data read command is first fed from an external controlunit to the flash memory and a sector address is subsequently fed. Thesector address is equivalent to a location to which data is additionallywritten later. When the flash memory is supplied with the data readcommand, it sets each circuit in the memory in a read mode (Step S11 ofFIG. 13). When the address is input then, it is stored in an addressregister (Step S12).

When a start command is input from the outside, the address data storedin the address register is read from a memory array and outputexternally. The external control unit stores the data that has beenoutput from the flash memory in a predetermined save area within anexternal memory. Further, the external control unit creates writeexpected value data from the read data stored in the save area andadditional write data, and holds the write expected value data in theexternal memory.

Subsequently, an erase command and a sector address are fed from theexternal control unit into the flash memory. Then the flash memory setseach circuit of the memory in an erase mode and stores the address thusinput in the address register (Steps S21, S22 of FIG. 14). When thestart command is input, the flash memory applies a bias voltage forestablishing an erased or pseudo-erasing state to a memory cellcorresponding to the sector address set by the address register so as tovary the threshold (Step S23). Then the flash memory effects a verifyread to confirm whether or not the data has been erased, the processreturns to Step S23 when it has not been erased yet, and applies anerase pulse to the memory cell again (Steps S24, S25). The erase verifyat S23-S25 is utilized at the time of normal erasing, but is not used atpseudo-erasing.

Then the write command, the sector address and the write expected valuedata are successively input from the external control unit to the flashmemory, whereupon the flash memory sets the write mode in each of thecircuits in the memory, and stores the address thus input in the addressregister and the write expected value data in the data register (StepsS31, S32, S33 of FIG. 15). When the start command is input subsequently,the flash memory applies the write pulse to the memory cellcorresponding to the sector address set in the address register so as tovary the threshold (Step S34). Then the flash memory effects a verifyread to confirm whether or not the data has been written, and returns toStep S34 when the data has not been written, so as to apply the writepulse to the memory cell again (Steps S35, S36).

Although a description has been given of a macro additional writecommand as the combination of three basic instructions including theread, erase, and write commands, an effect similar to that obtainable inEmbodiment 1 can be anticipated with respect to the additional writingthat can be carried out by avoiding the word disturbance withoutexecuting the erase instruction. However, the effect of saving theprocedure at Step S4 of FIG. 4 for outputting the write data externallyfrom the memory chip becomes less distinct than the embodiment of FIG.4.

FIG. 16 shows still another embodiment of the invention, wherein likereference numerals designate like component parts, and the repeateddescription thereof will be omitted. According to this embodiment of theinvention, there are provided a data saving register 27 for use as thesave area according to the preceding embodiment thereof, and anarithmetic circuit (corresponding to write expected value data) 28 foroperating on write expected value data in the flash memory. Thesequencer 22 according to this embodiment of the invention has afunction of decoding an additional write command fed from an externalcontrol unit and controlling the data saving register 27 and thearithmetic circuit 28 at proper timings so as to carry out additionalwriting.

Embodiment 4

FIG. 17 shows a memory card as an application of the flash memoryaccording to the above-described embodiments of the invention. A memorycard 100 comprises a plurality of flash memory chips 10 and a controllerchip 110 for controlling read/write operations. A bus (not shown)provided in the card is used to connect the controller chip 110 and theflash memory chips 10. The aforementioned additional write command andother commands, a sector address, write data, and control signals suchas a write enable signal are supplied from the controller chip 110 viathe bus to the flash memory chips; terminals/conductors 120 are providedalong one side of the card for signal input/output and power supply.

A description has been given of a nonvolatile memory array for a flashmemory, and of a command sequencer for executing instructions, mountedon one chip in Embodiments 1 and 2 of the invention, which may also beimplemented in the form of a card as shown in FIG. 17. In this case,importance is attached to a nonvolatile memory system in which thecontroller chip 110 at least follows an additional write commandprocedure of FIG. 4.

Other aspects of implementing the present invention, other than thememory card as mentioned above, include a memory card comprising aplurality of flash memory chips with the omission of the controller chip110, and a personal computer including a CPU to which the aforementionedmemory card is connectable. In this case, a program for the CPU containsall commands such as an erase command and a write command necessary forcontrolling the flash memory; further, the additional write command ofFIG. 4 or the macro additional write command as the combination of basicinstructions of FIGS. 13-15 may be used for this purpose.

As set forth above, according to the above-described embodiments of theinvention, the data stored in a sector at a designated address is readand saved in the register when the predetermined command is issued andthe sector is subjected to single-sector erasing. Then, the actual finalwrite data (write expected value data) is formed from the saved data anddata to be additionally written and used to perform the writingoperation. Therefore, this arrangement has the effect of preventingerror data from being read since variation in the threshold of thememory cell due to the disturbance related to the word line is recoveredat the time of additional writing.

When additional write data is fed from the outside while the data readfrom the selected sector is held in the internal register, the writingoperation is performed after the write expected value data isautomatically and internally formed. Therefore, the additional writingoperation can be performed quicker than the ordinary writing operationwith the effect of lightening the burden imposed on software at the timeof additional writing.

Consequently, it is possible to provide, within the same sector, amixture of the system area intended for information that is not openedto general users (such as OS and sector control information) and theuser area to which the user is allowed to freely write data in the caseof flash memories according to above-described embodiments of theinvention as shown in FIGS. 22( a)-22(f), whereby the memory iseffectively utilizable. This is due to the fact that, in a flash memoryof such a storage system, predetermined data is written to the systemarea and the user area is offered to the user in the unwritten state,and because the additional writing operation is performable when theuser writes data thereto.

Control data of FIGS. 22( a)-22(f) include, for example, parity codes,error correction codes, the number of times the sector involved isrewritten, and whether or not the sector contains bad bits; sectioncontrol information indicative of the usable/unused condition of asection when the sector is divided into a plurality of sections so thateach section is additionally writable; and the like.

Although a detailed description has been given of the present inventionon the basis of preferred embodiments thereof, the present invention isnot limited to these embodiments but may be modified without departurefrom the spirit and scope of the invention. For example, a descriptionhas been given of the case where the two mats have been used toconstitute the memory array according to the embodiments of theinvention, the present invention is not so limited, but may beapplicable to a case where the memory array is divided into a pluralityof mats or formed with one mat.

Further, although a description has been given of a flash memory of thesingle-sector erasing type, the invention is not so limited, but may bewidely applicable to nonvolatile memories with FAMOS storage elements,and to semiconductor devices provided with memory cells each having aplurality of thresholds.

The effect obtained from the representative embodiments of the inventiondisclosed in the present patent application are briefly summarized asfollows:

According to the present invention, variation in the threshold of thememory cell due to the disturbance related to the word line in thenonvolatile semiconductor memory is recovered and error data isprevented from being read out. Further, the additional writing operationcan be performed quicker than the ordinary writing operation with theeffect of lightening the burden imposed on software at the time ofadditional writing.

1. A method of programming for a nonvolatile memory, which comprises aplurality of word lines, each of which is coupled with memory cells, andis adapted to perform an erase operation and a program operation,wherein in the erase operation, all of the memory cells coupled to aselected word line shift into an erase state, wherein in the programoperation, a first part of said memory cells coupled to the selectedword line are in a corresponding state in accordance with first databefore performing the program operation and a second part of said memorycells coupled the selected word line are in the erase state, wherein themethod comprises the steps of: receiving second data, quantity of whichis 512 byte, to be programmed to the second part of memory cells coupledto the selected word line, merging the first data already programmed inthe first part of the memory cells and the second data to be programmedin the second part of the memory cells, and programming the second datato the second part of memory cells coupled to the selected word line,the first part of memory cells coupled the selected word line remainingin the corresponding state in accordance with the first data beforeperforming the program operation by programming a merged data to thememory cells coupled with the selected word line.
 2. A method ofprogramming for the nonvolatile memory according to claim 1, wherein thefirst data already programmed to the first part of memory cells beforethe program operation is used as management information.
 3. A method ofprogramming for the nonvolatile memory according to claim 2, wherein thememory cells coupled to the selected word line are capable of beingprogrammed with data more than 512 byte.
 4. A method of programming forthe nonvolatile memory according to claim 1, wherein each of the memorycells coupled to the selected word line has a threshold voltage withinone of an erase state voltage range and a program state voltage range.